Wet Bench System μCHEM
![](https://mot-semicon.com/wp-content/uploads/sites/2/2024/06/Header_Website_µCHEM-4-scaled.jpg)
- Designed for the use in clean room environment, the shell is made of polypropylene or stainless steel for solvent applications
- Suitable for etching application in the field of micro technology and semiconductors
- Heatable Quartz Tank for clean wafer processing
- Additional process cells could be integrated, made of PTFE, PVDF, PP,…
- Circulation and Heating systems
- fire extinguishing on request
- fully automatic processfully automatic chemical drain and dosing on request
- compatible to different wafer size up to 12″, fully automatic handling of the Carriers
![](https://mot-semicon.com/wp-content/uploads/sites/2/2024/06/MOT_Maerz_23_10-1024x683.jpg)
![](https://mot-semicon.com/wp-content/uploads/sites/2/2024/06/MOT-µCHEM-4_frei-2-scaled.jpg)
Additional components
- Spin coater, Hot plates, Megasonic cleaning systems…
- Rinsing cell or Quick Dump Rinser
- Automation for handling wafer baskets possible
- Customized solutions are possible
![](https://mot-semicon.com/wp-content/uploads/sites/2/2024/06/MOT_Maerz_23_16-2-scaled.jpg)
MOT Semicon can help you to design specific workflow concepts offering you flexible high grade wet bench solutions.
![](https://mot-semicon.com/wp-content/uploads/sites/2/2021/06/09_Wet-Bench-System_05-tinified.png)
![](https://mot-semicon.com/wp-content/uploads/sites/2/2021/06/10_Wet-Bench-System_06-tinified.jpg)